Si 기판에 Ge 사전-비정질화와 추가 RTA 공정을 이용한 얕은 p+-n 접합 형성

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Publisher
한국물리학회
Issue Date
1996-07
Language
Korean
Citation

응용물리, v.9, no.4, pp.506 - 512

ISSN
1013-7009
URI
http://hdl.handle.net/10203/78057
Appears in Collection
EE-Journal Papers(저널논문)
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