DSpace at KOASAS: Application of DV-Xa Cluster Method to the Cr-Al Oxide Mask Materials for Deep UV Lithography

DSpace at KOASAS

College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

Application of DV-Xa Cluster Method to the Cr-Al Oxide Mask Materials for Deep UV Lithography

Cited 0 time in webofscience

Cited 0 time in scopus

Hit : 502
Download : 0

Export

Jiang, Zhong-Tao / Yamaguchi, Tomuo / Kim, Eunah / Hong, Seung Bum / No, Kwangsoo researcher / Kang, Young Seog / Park, Soon Ja / Koh, Young Bum

Publisher: Society for Discrete Variational Xa

Issue Date: 1997-01

Language: English

Citation: BULLETIN OF THE SOCIETY FOR DISCRETE VARIATIONAL XA, v.10, no.2, pp.22 - 26

URI: http://hdl.handle.net/10203/71942

Appears in Collection: MS-Journal Papers(저널논문)

Files in This Item: There are no files associated with this item.

Display Full Item Record

qr_code

트윗하기

KOASAS

Knowledge Service Development Team, KAIST 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea. T. 82-42-350-4493 Email. koasas@kaist.ac.kr
Copyright © 2016. Korea Advanced Institute of Science and Technology. All Rights Reserved.

KOASAS

KOASAS

Browse

Application of DV-Xa Cluster Method to the Cr-Al Oxide Mask Materials for Deep UV Lithography

KOASAS

Communities & Collections