Ir and Ru bottom electrodes for (Ba, Sr) TiO3 thin films deposited by liquid delivery source chemical vapor deposition

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The electrical properties and surface morphologies of (Ba, Sr)TiO3 thin films, with various bottom electrode structures, deposited by liquid delivery metal organic chemical vapor deposition were investigated. Ir and Ru films as a bottom electrode with varying deposition temperatures were prepared onto Sie, and polySi substrate structures using ion beam sputtering technique. It is observed that electrical properties of BST films deposited by liquid delivery MOCVD was changed with the deposition temperatures of Zr and Ru as well as substrate structures. Furthermore, it is revealed that these variations in leakage current could be strongly related with the roughness of BST films. (C) 1998 Published by Elsevier Science S.A. All rights reserved.
Publisher
Elsevier Science Sa
Issue Date
1998-06
Language
ENG
Article Type
Article
Appears in Collection
MS-Journal Papers(저널논문)
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