HIGH-EFFICIENCY DELTA-DOPED AMORPHOUS-SILICON SOLAR-CELLS PREPARED BY PHOTOCHEMICAL VAPOR-DEPOSITION

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dc.contributor.authorHIGUCHI, Kko
dc.contributor.authorTABUCHI, Kko
dc.contributor.authorLim, Koeng Suko
dc.contributor.authorKONAGAI, Mko
dc.contributor.authorTAKAHASHI, Kko
dc.date.accessioned2013-02-27T06:55:45Z-
dc.date.available2013-02-27T06:55:45Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1991-08-
dc.identifier.citationJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.30, no.8, pp.1635 - 1640-
dc.identifier.issn0021-4922-
dc.identifier.urihttp://hdl.handle.net/10203/67105-
dc.description.abstractAmorphous Si solar cells with delta-doped (delta-doped) p-layer were prepared by a multichamber photochemical vapor deposition (photo-CVD) system. By optimizing the structure of the delta-doped p-layer, a conversion efficiency of 12.3% (AM1) was obtained for small-area solar cells with a delta-doped (AM1) was obtained for small-area solar cells with a delta-doped p-layer using B2H6 as a dopant source. The delta-doped p-layers deposited with trimethylboron (TMB) and triethylboron (TEB) as new boron sources were characterized. It was found that the boron layers obtained with TMB by photo-CVD contain a large amount of carbon atoms which degrade the solar cell performance. Carbon contamination was suppressed both by the plasma CVD method with a gas mixture of TMB, H2 and He and by the photo-CVD method with TEB.-
dc.languageEnglish-
dc.publisherJAPAN J APPLIED PHYSICS-
dc.subjectP-LAYER-
dc.titleHIGH-EFFICIENCY DELTA-DOPED AMORPHOUS-SILICON SOLAR-CELLS PREPARED BY PHOTOCHEMICAL VAPOR-DEPOSITION-
dc.typeArticle-
dc.identifier.wosidA1991GE24900009-
dc.identifier.scopusid2-s2.0-0026205461-
dc.type.rimsART-
dc.citation.volume30-
dc.citation.issue8-
dc.citation.beginningpage1635-
dc.citation.endingpage1640-
dc.citation.publicationnameJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS-
dc.identifier.doi10.1143/JJAP.30.1635-
dc.contributor.localauthorLim, Koeng Su-
dc.contributor.nonIdAuthorHIGUCHI, K-
dc.contributor.nonIdAuthorTABUCHI, K-
dc.contributor.nonIdAuthorKONAGAI, M-
dc.contributor.nonIdAuthorTAKAHASHI, K-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorDELTA-DOPED P-LAYER-
dc.subject.keywordAuthorAMORPHOUS SILICON-
dc.subject.keywordAuthorSOLAR CELL-
dc.subject.keywordAuthorPHOTO-CVD-
dc.subject.keywordPlusP-LAYER-
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