전자 싸이클로트론 공명 플라즈마 화학증착법에 의한 실리콘 질화막 형성 및 특성연구 On the silicon nitride film formation and characteristic study by chemical vapor deposition method using electron cyclotron resonance plasma

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Publisher
한국표면공학회
Issue Date
1992
Language
KOR
Citation

한국표면공학회지, v.25, no.6, pp.287 - 292

ISSN
1225-8024
URI
http://hdl.handle.net/10203/65467
Appears in Collection
PH-Journal Papers(저널논문)
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