전자 싸이클로트론 공명 플라즈마 화학증착법에 의한 실리콘 질화막 형성 및 특성연구 On the silicon nitride film formation and characteristic study by chemical vapor deposition method using electron cyclotron resonance plasma

Publisher
한국표면공학회
Issue Date
1992
Language
KOR
Citation

한국표면공학회지, v.25, no.6, pp.287 - 292

ISSN
1225-8024
URI
http://hdl.handle.net/10203/65467
Appears in Collection
PH-Journal Papers(저널논문)
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