Epitaxial Growth of C54 TiSi2 and Double Heteroepitaxial Si/C54 TiSi2(111) System
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | C.K. Choi | ko |
| dc.contributor.author | K.H. Kim | ko |
| dc.contributor.author | J.Y. Lee | ko |
| dc.contributor.author | D.S. Park | ko |
| dc.contributor.author | H.W. Kwak | ko |
| dc.contributor.author | H.H. Park | ko |
| dc.contributor.author | M.C. Paek | ko |
| dc.contributor.author | K.I. Cho | ko |
| dc.contributor.author | O.J. Kwon | ko |
| dc.date.accessioned | 2013-02-25T19:59:39Z | - |
| dc.date.available | 2013-02-25T19:59:39Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1991-12 | - |
| dc.identifier.citation | ETRI JOURNAL, v.13, no.1, pp.10 - 12 | - |
| dc.identifier.issn | 1225-6463 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/64864 | - |
| dc.language | English | - |
| dc.publisher | 한국전자통신연구원 | - |
| dc.title | Epitaxial Growth of C54 TiSi2 and Double Heteroepitaxial Si/C54 TiSi2(111) System | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 13 | - |
| dc.citation.issue | 1 | - |
| dc.citation.beginningpage | 10 | - |
| dc.citation.endingpage | 12 | - |
| dc.citation.publicationname | ETRI JOURNAL | - |
| dc.contributor.localauthor | J.Y. Lee | - |
| dc.contributor.nonIdAuthor | C.K. Choi | - |
| dc.contributor.nonIdAuthor | K.H. Kim | - |
| dc.contributor.nonIdAuthor | D.S. Park | - |
| dc.contributor.nonIdAuthor | H.W. Kwak | - |
| dc.contributor.nonIdAuthor | H.H. Park | - |
| dc.contributor.nonIdAuthor | M.C. Paek | - |
| dc.contributor.nonIdAuthor | K.I. Cho | - |
| dc.contributor.nonIdAuthor | O.J. Kwon | - |
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