TiSi2와 다결정 실리콘에 이온주입된 As계에서 TiAs침전물형성에 관한 고분해능 TEM 연구 High-Resolution TEM Study on TiAs Precipitate Formation Between TiSi2 and As Doped in Poly-Silicon

Publisher
대한전자공학회
Issue Date
1991-12
Language
KOR
Citation

전자공학회논문지, v.28, no.5, pp.375 - 379

ISSN
1975-2377
URI
http://hdl.handle.net/10203/64861
Appears in Collection
MS-Journal Papers(저널논문)
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