ACTIVATION AND RECRYSTALLIZATION OF ION-IMPLANTED AMORPHOUS-SILICON FILMS BY RAPID THERMAL ANNEALING

Publisher
AMER INST PHYSICS
Issue Date
1989-05
Language
ENG
Citation

JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.7, no.3, pp.796 - 801

ISSN
0734-2101
DOI
10.1116/1.575843
URI
http://hdl.handle.net/10203/64819
Appears in Collection
NE-Journal Papers(저널논문)
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