MICROSCOPIC AND MACROSCOPIC UNIFORMITY CONTROL IN PLASMA-ETCHING
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | GIAPIS, KP | ko |
| dc.contributor.author | SCHELLER, GR | ko |
| dc.contributor.author | GOTTSCHO, RA | ko |
| dc.contributor.author | HOBSON, WS | ko |
| dc.contributor.author | Lee, Yong-Hee | ko |
| dc.date.accessioned | 2013-02-25T19:47:26Z | - |
| dc.date.available | 2013-02-25T19:47:26Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1990-09 | - |
| dc.identifier.citation | APPLIED PHYSICS LETTERS, v.57, no.10, pp.983 - 985 | - |
| dc.identifier.issn | 0003-6951 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/64808 | - |
| dc.language | English | - |
| dc.publisher | AMER INST PHYSICS | - |
| dc.title | MICROSCOPIC AND MACROSCOPIC UNIFORMITY CONTROL IN PLASMA-ETCHING | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1990DW57000012 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 57 | - |
| dc.citation.issue | 10 | - |
| dc.citation.beginningpage | 983 | - |
| dc.citation.endingpage | 985 | - |
| dc.citation.publicationname | APPLIED PHYSICS LETTERS | - |
| dc.identifier.doi | 10.1063/1.103532 | - |
| dc.contributor.localauthor | Lee, Yong-Hee | - |
| dc.contributor.nonIdAuthor | GIAPIS, KP | - |
| dc.contributor.nonIdAuthor | SCHELLER, GR | - |
| dc.contributor.nonIdAuthor | GOTTSCHO, RA | - |
| dc.contributor.nonIdAuthor | HOBSON, WS | - |
| dc.type.journalArticle | Article | - |
- Appears in Collection
- PH-Journal Papers(저널논문)
- Files in This Item
- A1990DW57000012.pdf(690.86 kB)Download
This item is cited by other documents in WoS
| ⊙ Detail Information in WoSⓡ | Click to see |  |
| ⊙ Cited 44 items in WoS | Click to see citing articles in |  |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.