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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Directed Self-Assembly with Sub-100 Degrees Celsius Processing Temperature, Sub-10 Nanometer Resolution, and Sub-1 Minute Assembly Time Park, Woon-Ik; Kim, Kyung-Ho; Jang, Hyun-Ik; Jeong, Jae-Won; Kim, Jong-Min; Choi, Jae-Suk; Park, Jae-Hong; Jung, Yeon-Sik, SMALL, v.8, no.24, pp.3762 - 3768, 2012-12 | |
| Si-containing block copolymers for self-assembled nanolithography Ross, CA; Jung, Yeon Sik; Chuang, VP; Ilievski, F; Yang, JKW; Bita, I; Thomas, EL; Smith, Henry I; Berggren, KK; Vancso, GJ; Cheng, JY, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.26, no.6, pp.2489 - 2494, 2008-11 | |
| Graphoepitaxy of self-assembled block copolymers on two-dimensional periodic patterned templates Bita, Ion; Yang, Joel K. W.; Jung, Yeon Sik; Ross, Caroline A.; Thomas, Edwin L.; Berggren, Karl K., SCIENCE, v.321, no.5891, pp.939 - 943, 2008-08 | |
| Enhancing the Potential of Block Copolymer Lithography with Polymer Self-Consistent Field Theory Simulations Mickiewicz, Rafal A.; Yang, Joel K. W.; Hannon, Adam F.; Jung, Yeon Sik; Alexander-Katz, Alfredo; Berggren, Karl K.; Ross, Caroline A., MACROMOLECULES, v.43, no.19, pp.8290 - 8295, 2010-10 | |
| Large-area, highly oriented lamellar block copolymer nanopatterning directed by graphoepitaxially assembled cylinder nanopatterns Moon, Hyoung-Seok; Shin, Dong-Ok; Kim, Bong-Hoon; Jin, Hyeong-Min; Lee, Su-Mi; Lee, Moon-Gyu; Kim, Sang-Ouk, JOURNAL OF MATERIALS CHEMISTRY, v.22, no.13, pp.6307 - 6310, 2012-04 | |
| Directed assembly of block copolymer blends into nonregular device-oriented structures Stoykovich, MP; Muller, M; Kim, Sang Ouk; Solak, HH; Edwards, EW; de Pablo, JJ; Nealey, PF, SCIENCE, v.308, no.5727 , pp.1442 - 1446, 2005-06 | |
| Low-temperature growth and characterization of epitaxial ZnO nanorods by metalorganic chemical vapor deposition Kim, DC; Kong, BH; Jeon, SY; Yoo, JB; Cho, HK; Park, DJ; Lee, JeongYong, JOURNAL OF MATERIALS RESEARCH, v.22, pp.2032 - 2036, 2007-07 | |
| 3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene Kim, Ju-Young; Lim, Joonwon; Jin, Hyeong-Min; Kim, Bong-Hoon; Jeong, Seong-Jun; Choi, Dong-Sung; Li, Dong Jun; Kim, Sang Ouk, ADVANCED MATERIALS, v.28, no.8, pp.1591 - 1596, 2016-02 | |
| Multicomponent Nanopatterns by Directed Block Copolymer Self-Assembly Shin, Dong Ok; Mun, Jeong Ho; Hwang, Geon-Tae; Yoon, Jong Moon; Kim, Ju Young; Yun, Je Moon; Yang, Yong-Biao; Oh, Youngtak; Lee, JeongYong; Shin, Jonghwa; Lee, Keonjae; Park, Soojin; Kim, Jaeup U.; Kim, Sang Ouk, ACS NANO, v.7, no.10, pp.8899 - 8907, 2013-10 | |
| Spontaneous Lamellar Alignment in Thickness-Modulated Block Copolymer Films Kim, Bong-Hoon; Lee, Hyung-Min; Lee, Joo-Hyung; Son, Seung-Woo; Jeong, Seong-Jun; Lee, Su-Mi; Lee, Dong-Il; Kwak, Sin-Ung; Jeong, Ha-Woong; Shin, Hyun-Jung; Yoon, Jun-Bo; Lavrentovich, Oleg D.; Kim, Sang-Ouk, ADVANCED FUNCTIONAL MATERIALS, v.19, no.16, pp.2584 - 2591, 2009-08 |
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