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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Facile conversion of a cellulose acetate laminate film to graphene by a lamination process and post-annealing Kim, Dong-Hyuk; Han, Ji-Yeon; Lee, Dong-Chan; Lee, Yong-Hee; Jeon, Duk-Young, JOURNAL OF MATERIALS CHEMISTRY, v.22, no.37, pp.20026 - 20031, 2012 | |
| Synthesis of aligned GaN nanorods on Si (111) by molecular beam epitaxy Kim, YH; Lee, JeongYong; Lee, SH; Oh, JE; Lee, HS, APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.80, pp.1635 - 1639, 2005-05 | |
| Formation identification of Y2BaCuO5 and BaCeO3 in MOCVD-processed YBCO films with Ce doping Kim, Youngha; Kim, CJ; Jun, BH; Sung, TH; Han, YH; Han, SC; No, Kwangsoo, SUPERCONDUCTOR SCIENCE & TECHNOLOGY, v.22, 2009-06 | |
| The relation between the microstructural properties and the geometry factors for GaN nanorods formed on Si(111) substrates Lee, KH; Lee, JeongYong; Kwon, YH; Ryu, SY; Kang, TW; Jung, HY; Park, SH; Lee, DU; Kim, TW, SOLID STATE COMMUNICATIONS, v.150, pp.636 - 639, 2010-04 | |
| Nucleation behavior in the presence of charge in the CVD diamond process Choi, K; Kang, Suk-Joong L; Jang, HM; Hwang, NM, JOURNAL OF CRYSTAL GROWTH, v.172, no.3-4, pp.416 - 425, 1997-03 | |
| Phase control of iridium and iridium oxide thin films in atomic layer deposition Kim, Sung-Wook; Kwon, Se-Hun; Kwak, Dong-Kee; Kang, Sang-Won, JOURNAL OF APPLIED PHYSICS, v.103, no.2, 2008-01 | |
| A Facile Way to Control the Number of Walls in Carbon Nanotubes through the Synthesis of Exposed-Core/Shell Catalyst Nanoparticles Choi, Kyung-Min; Augustine, Saji; Choi, Jung-Hoon; Lee, Ju-Ho; Shin, Weon-Ho; Yang, Seong-Ho; Lee, Jeong-Yong; Kang, Jeung-Ku, ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.47, no.51, pp.9904 - 9907, 2008 | |
| Studies on the Controlling of the Microstructural and Morphological Properties of Al Doped ZnO Thin Films Prepared by Hydrothermal Method Gang, Myeng Gil; Shin, Seung Wook; Gurav, K. V.; Wang, YinBo; Agawane, G. L.; Lee, JeongYong; Moon, Jong-Ha; Kim, Jin Hyeok, JAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.10, 2013-10 | |
| Interstitial oxygen incorporation into silicon substrate during plasma enhanced atomic layer deposition of Al2O3 Kim, H; Jeon, WS; Jung, SH; Ahn, Byung Tae, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.8, no.10, pp.294 - 296, 2005 | |
| Deposition of PZT films by MOCVD at low temperature and their change in properties with annealing temperature and Zr/Ti ratio Kim, YM; Lee, WJ; Kim, Ho Gi, THIN SOLID FILMS, v.279, no.1-2, pp.140 - 144, 1996-06 |
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