Effects of SiH4 on Resistivity of Plasma Enhanced Chemical Vapor Deposition Tungsten Thin Films

Publisher
한국물리학회
Issue Date
1990-12
Language
KOR
Citation

JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.23, no.6, pp.518 - 522

ISSN
3744-4884
URI
http://hdl.handle.net/10203/58458
Appears in Collection
EE-Journal Papers(저널논문)
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