EFFECT OF PARTIAL-PRESSURE OF THE REACTANT GAS ON THE CHEMICAL VAPOR-DEPOSITION OF AL2O3

Publisher
ELSEVIER SCIENCE SA LAUSANNE
Issue Date
1982
Language
ENG
Citation

THIN SOLID FILMS, v.97, no.1, pp.97 - 106

ISSN
0040-6090
DOI
10.1016/0040-6090(82)90421-7
URI
http://hdl.handle.net/10203/58390
Appears in Collection
RIMS Journal Papers
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