Theoretical model and experimental results of PECVD amorphous silicon deposition process

Publisher
대한전자공학회
Issue Date
1990-01
Language
KOR
Citation

전자공학회논문지, v.27, no.6, pp.816 - 1058

ISSN
1016-135X
URI
http://hdl.handle.net/10203/58271
Appears in Collection
CBE-Journal Papers(저널논문)
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