동시증착에 의한 Si(111) - 7×7 기판 위에 TiSi₂ 에피택셜 성장 In-situ Epitaxial Growth of the TiSi2 on Si (111)-7*7 Substrate by Codeposition

Publisher
한국진공학회
Issue Date
1994-12
Language
KOR
Citation

한국진공학회지, v.3, no.4, pp.405 - 413

ISSN
1225-8822
URI
http://hdl.handle.net/10203/56865
Appears in Collection
MS-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.
  • Hit : 160
  • Download : 0
  • Cited 0 times in thomson ci

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0