The fabrication of submicron patterns on curved substrates using a polydimethylsiloxane film mould

Abstract

Submicron features have been formed on polymer-coated cylindrical and spherical substrates via hot-embossing with a polydimethylsiloxane (PDMS) film stamp, without the use of high pressure. The use of flexible PDMS moulds offers a unique advantage over conventional methods, because they cover curved substrates easily, maintaining good contact with the substrate even during the hot-embossing procedure. Using this approach, uniform submicron patterns have been easily generated on curved substrates without distortion or defect formation, eliminating the need for complex and expensive lithography processes.