RF PECVD 법에 의해 증착된 TiN 박막 특성에 관한 연구A study on the characteristics of the TiN thin films deposited by RF PECVD

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dc.contributor.advisor이원종-
dc.contributor.advisorLee, Won-Jong-
dc.contributor.author전병혁-
dc.contributor.authorJun, Byung-Hyuk-
dc.date.accessioned2011-12-15T01:40:59Z-
dc.date.available2011-12-15T01:40:59Z-
dc.date.issued1995-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=99499&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51275-
dc.description학위논문(석사) - 한국과학기술원 : 전자재료공학과, 1995.2, [ iv, 75 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.titleRF PECVD 법에 의해 증착된 TiN 박막 특성에 관한 연구-
dc.title.alternativeA study on the characteristics of the TiN thin films deposited by RF PECVD-
dc.typeThesis(Master)-
dc.identifier.CNRN99499/325007-
dc.description.department한국과학기술원 : 전자재료공학과, -
dc.identifier.uid000933436-
dc.contributor.localauthor전병혁-
dc.contributor.localauthorJun, Byung-Hyuk-
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MS-Theses_Master(석사논문)
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