Polycide 구조로 저압화학증착된 $WSi_x$ 박막의 열처리에 따른 거동Effects of annealing on the properties of $Si_3N_4$ films in polycide structrue formed by LPCVD method
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 임호빈 | - |
| dc.contributor.advisor | Im, Ho-Bin | - |
| dc.contributor.author | 이재호 | - |
| dc.contributor.author | Lee, Jae-Ho | - |
| dc.date.accessioned | 2011-12-15T01:39:08Z | - |
| dc.date.available | 2011-12-15T01:39:08Z | - |
| dc.date.issued | 1989 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=67012&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/51159 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 1989.2, [ [iii], 49 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | Low-pressure chemical vapor deposition. | - |
| dc.title | Polycide 구조로 저압화학증착된 $WSi_x$ 박막의 열처리에 따른 거동 | - |
| dc.title.alternative | Effects of annealing on the properties of $Si_3N_4$ films in polycide structrue formed by LPCVD method | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 67012/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000871325 | - |
| dc.contributor.localauthor | 임호빈 | - |
| dc.contributor.localauthor | Im, Ho-Bin | - |
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