$Si_3N_4$ 의 화학증착과 증착층의 전기적 성질에 대한 연구A study on chemical vapor deposition of $Si_3N_4$ thin film and its electrical properties

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dc.contributor.advisor김호기-
dc.contributor.advisorKim, Ho-Gi-
dc.contributor.author김광준-
dc.contributor.authorKim, Kwang-Jun-
dc.date.accessioned2011-12-15T01:36:01Z-
dc.date.available2011-12-15T01:36:01Z-
dc.date.issued1985-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=64856&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50964-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 1985.2, [ [iii], 46 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.title$Si_3N_4$ 의 화학증착과 증착층의 전기적 성질에 대한 연구-
dc.title.alternativeA study on chemical vapor deposition of $Si_3N_4$ thin film and its electrical properties-
dc.typeThesis(Master)-
dc.identifier.CNRN64856/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000831034-
dc.contributor.localauthor김호기-
dc.contributor.localauthorKim, Ho-Gi-
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MS-Theses_Master(석사논문)
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