157 nm 광 리소그래피용 a-Si 박막과 Si-O-N 박막의 광학 특성 분석Optical properties of a-Si films and Si-O-N films for 157 nm optical lithography

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Advisors
노광수researcherNo, Kwang-Sooresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2003
Identifier
180279/325007 / 020013089
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 2003.2, [ vii, 90 p. ]

Keywords

Si-O-N 박막; a-Si 박막; 위상 변위 막; 157 nm 리소그패피; 광학 특성; optical properties; Si-O-N thin film; a-Si thin film; phase shift mask; 157nm lithography

URI
http://hdl.handle.net/10203/50915
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=180279&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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