DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 최시경 | - |
dc.contributor.advisor | Choi, Si-Kyung | - |
dc.contributor.author | 장준기 | - |
dc.contributor.author | Jang, Jun-Gee | - |
dc.date.accessioned | 2011-12-15T01:34:38Z | - |
dc.date.available | 2011-12-15T01:34:38Z | - |
dc.date.issued | 2002 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=174016&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/50880 | - |
dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 2002.2, [ iii, 60 p. ] | - |
dc.language | kor | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | 유전률 | - |
dc.subject | 플라즈마 처리 | - |
dc.subject | 두께 | - |
dc.subject | thickness | - |
dc.subject | breakdown field | - |
dc.subject | dielectric constant | - |
dc.subject | plasma treatment | - |
dc.title | 두께 및 플라즈마 처리가 Anatase $TiO_2$ 박막의 전기적 특성에 미치는 영향 | - |
dc.title.alternative | Effect of thickness and plasma treatment on electrical properties of Anatase $TiO_2$ films | - |
dc.type | Thesis(Master) | - |
dc.identifier.CNRN | 174016/325007 | - |
dc.description.department | 한국과학기술원 : 재료공학과, | - |
dc.identifier.uid | 020003474 | - |
dc.contributor.localauthor | 최시경 | - |
dc.contributor.localauthor | Choi, Si-Kyung | - |
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