두께 및 플라즈마 처리가 Anatase $TiO_2$ 박막의 전기적 특성에 미치는 영향Effect of thickness and plasma treatment on electrical properties of Anatase $TiO_2$ films
- Advisors
- 최시경researcher; Choi, Si-Kyungresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2002
- Identifier
- 174016/325007 / 020003474
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 2002.2, [ iii, 60 p. ]
- Keywords
유전률; 플라즈마 처리; 두께; thickness; breakdown field; dielectric constant; plasma treatment
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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