두께 및 플라즈마 처리가 Anatase $TiO_2$ 박막의 전기적 특성에 미치는 영향 = Effect of thickness and plasma treatment on electrical properties of Anatase $TiO_2$ films

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Advisors
최시경researcherChoi, Si-Kyungresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2002
Identifier
174016/325007 / 020003474
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 2002.2, [ iii, 60 p. ]

Keywords

유전률; 플라즈마 처리; 두께; thickness; breakdown field; dielectric constant; plasma treatment

URI
http://hdl.handle.net/10203/50880
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=174016&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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