D.C. 마그네트론 반응성 스퍼터링법으로 증착한 ITO박막에 있어서 고유응력, 배향성 그리고 밀도가 비저항에 미치는 영향 = Effect of density, intrinsic stress and crystallographic orientation on resistivity of ITO thin films deposited by D.C. magnetron reactive sputtering

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Advisors
최시경researcherChoi, Si-Kyungresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2000
Identifier
158616/325007 / 000983444
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 2000.2, [ iv, 74 p. ]

Keywords

밀도; 응력; 산화물 전극; 마그네트론 스퍼터링; Magnetron sputtering; Density; Stress; ITO

URI
http://hdl.handle.net/10203/50789
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=158616&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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