DC reactive magnetron sputtering 방법으로 증착된 MCM용 비정질 $Ta_2O_5$ 박막 커패시터에 관한 연구A study on the amorphous $Ta_2 O_5$ thin film capacitors deposited by DC reactive magnetron sputtering for MCM applications
- Advisors
- 백경욱researcher; Paik, Kyung-Wookresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1999
- Identifier
- 150090/325007 / 000973647
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1999.2, [ iv, 72 p. ]
- Keywords
전기전도기구; 반응성스퍼터링; 산화탄탈륨; 멀티칩모듈; 비정질; Amorphous; Conduction mechanism; Reactive sputtering; Tantalum oxide; MCM
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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