DC magnetron sputtering법을 이용한 Ir 하부전극의 형성 및 특성평가와 $(Ba,Sr)TiO_3$ 박막의 특성 평가 = Preparation and characterization of iridium bottom electrode by DC magnetron sputtering and characterization of $(Ba,Sr)TiO_3$ thin film

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Advisors
김호기researcherKim, Ho-Giresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1998
Identifier
133545/325007 / 000963260
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 1998.2, [ 91 p. ]

Keywords

Ir bottom electrode; DC magnetron sputtering; BST; I-V; C-V; Different substrates

URI
http://hdl.handle.net/10203/50675
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=133545&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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