Ni/α-Si 계면에서 Ni 실리사이드 형성에 관한 연구 = A study of Ni silicide formation in Ni/α-Si system

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Advisors
이재영Lee, Jai-Young
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1996
Identifier
106164/325007 / 000943159
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 1996.2, [ [iii], 54 p. ]

Keywords

성장기구; 실리사이드; 활성화 에너지; $Ni_2Si$; Silicide; Activation Energy; Growth Kinetics Mechanism

URI
http://hdl.handle.net/10203/50571
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=106164&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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