저압화학증착법에 의한 $TiO_2$ 박막의 제조와 반응변수에 따른 증착 및 C-V 특성The fabrication of the $TiO_2$ thin film by low pressure chemical vapor deposition and the effect of the reaction parameters on the deposition and C-V characteristics
- Advisors
- 김호기researcher; Kim, Ho-Giresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1991
- Identifier
- 68044/325007 / 000891296
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1991.2, [ iii, 96 p. ]
- Keywords
Capacitance-voltage measurement.
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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