광리소그래피 위상변위마스크용 Cr-Al-O-N 박막의 개발Development of chromium aluminum oxynitride films as a phase shifting mask material for optical lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 노광수 | - |
| dc.contributor.advisor | No, Kwang-Soo | - |
| dc.contributor.author | 김은아 | - |
| dc.contributor.author | Kim, Eun-Ah | - |
| dc.date.accessioned | 2011-12-15T01:06:44Z | - |
| dc.date.available | 2011-12-15T01:06:44Z | - |
| dc.date.issued | 2001 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165670&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50405 | - |
| dc.description | 학위논문(박사) - 한국과학기술원 : 재료공학과, 2001.2, [ xxi, 214 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 크로뮴 알루미늄 옥시나이트라이드 | - |
| dc.subject | 광리소그래피 | - |
| dc.subject | 위상변위마스크 | - |
| dc.subject | 박막 | - |
| dc.subject | Film | - |
| dc.subject | Chromium Aluminum Oxynitride | - |
| dc.subject | Optical Lithography | - |
| dc.subject | Phase Shifting Mask | - |
| dc.title | 광리소그래피 위상변위마스크용 Cr-Al-O-N 박막의 개발 | - |
| dc.title.alternative | Development of chromium aluminum oxynitride films as a phase shifting mask material for optical lithography | - |
| dc.type | Thesis(Ph.D) | - |
| dc.identifier.CNRN | 165670/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000975063 | - |
| dc.contributor.localauthor | 김은아 | - |
| dc.contributor.localauthor | Kim, Eun-Ah | - |
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