광리소그래피 위상변위마스크용 Cr-Al-O-N 박막의 개발Development of chromium aluminum oxynitride films as a phase shifting mask material for optical lithography
- Advisors
- 노광수researcher; No, Kwang-Sooresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2001
- Identifier
- 165670/325007 / 000975063
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 2001.2, [ xxi, 214 p. ]
- Keywords
크로뮴 알루미늄 옥시나이트라이드; 광리소그래피; 위상변위마스크; 박막; Film; Chromium Aluminum Oxynitride; Optical Lithography; Phase Shifting Mask
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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