ECR 플라즈마 기상화학증착법으로 제조한 초고집적회로 금속화공정의 확산방지용 TiN 박막의 특성The characteristics of TiN thin films prepared by ECR-PECVD as a diffusion barrier layer in ULSI metallization process
- Advisors
- 이원종researcher; Lee, Won-Jongresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1997
- Identifier
- 113002/325007 / 000935085
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 1997.2, [ [iv], 112 p. ]
- Keywords
피복성; 확산방지; 티타늄질화막; 이시알플라즈마; ECR; Step coverage; Diffusion barrier; TiN; PECVD
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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