$Pb_5Ge_3O_{11}$ 강유전체 박막과 $HfAl_xO_y$ (x=0 또는 0.81) 유전체 박막을 이용한 MFIS 커패시터의 제조 및 특성 평가 = Fabrication and characterization of MFIS capacitors using ferroelectric $Pb_5Ge_3O_{11}$ and dielectric $HfAl_xO_y$ (x=0 or 0.81) thin films

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Advisors
김호기researcherKim, Ho-Giresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2003
Identifier
181087/325007 / 000985147
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 2003.2, [ iv, 109 p. ]

Keywords

$HfAl_xO_y$ (x=0 또는 0.81); 강유전체 박막; $Pb_5Ge_3O_{11}$; MFIS 커패시터; MFIS capacitor; $HfAl_xO_y$ (x=0 or 0.81); ferroelectric thin film; $Pb_5Ge_3O_{11}$

URI
http://hdl.handle.net/10203/50282
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=181087&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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