DSpace at KOASAS: $Pb_5Ge_3O_{11}$ 강유전체 박막과 $HfAl_xO_y$ (x=0 또는 0.81) 유전체 박막을 이용한 MFIS 커패시터의 제조 및 특성 평가 = Fabrication and characterization of MFIS capacitors using ferroelectric $Pb_5Ge_3O_{11}$ and dielectric $HfAl_xO_y$ (x=0 or 0.81) thin films

DSpace at KOASAS

College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Theses_Ph.D.(박사논문)

$Pb_5Ge_3O_{11}$ 강유전체 박막과 $HfAl_xO_y$ (x=0 또는 0.81) 유전체 박막을 이용한 MFIS 커패시터의 제조 및 특성 평가 = Fabrication and characterization of MFIS capacitors using ferroelectric $Pb_5Ge_3O_{11}$ and dielectric $HfAl_xO_y$ (x=0 or 0.81) thin films

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박정호 / Park, Jeong-Ho

Advisors: 김호기 researcher; Kim, Ho-Gi researcher

Description: 한국과학기술원 : 재료공학과,

Publisher: 한국과학기술원

Issue Date: 2003

Identifier: 181087/325007 / 000985147

Language: kor

Description: 학위논문(박사) - 한국과학기술원 : 재료공학과, 2003.2, [ iv, 109 p. ]

Keywords: $HfAl_xO_y$ (x=0 또는 0.81); 강유전체 박막; $Pb_5Ge_3O_{11}$; MFIS 커패시터; MFIS capacitor; $HfAl_xO_y$ (x=0 or 0.81); ferroelectric thin film; $Pb_5Ge_3O_{11}$

URI: http://hdl.handle.net/10203/50282

Link: http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=181087&flag=dissertation

Appears in Collection: MS-Theses_Ph.D.(박사논문)

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