$SrBi_2Ta_2O_9$ 강유전체 비 휘발 기억소자에서 Pt/Ti 전극의 hillock 생성Hillock formation in Pt/Ti electrode for $SrBi_2Ta_2O_9$ ferroelectric random access memory
- Advisors
- 최시경researcher; Choi, Si-Kyungresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2002
- Identifier
- 174586/325007 / 000935021
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 2002.2, [ xiii, 133 p. ]
- Keywords
압축 응력; Ti 산화; Pt/Ti 전극 적층; 힐락; SBT 커페시터; SBT capacitor; compressive stress; titanium oxidation; Pt/Ti electrode stack; platinum hillock
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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