반응기체의 분압이 $Al_2O_3$ 의 화학증탁에 미치는 영향에 관한 연구Effect of partial pressure of reactantgas on the chemical vapor deposition of $Al_2O_3$
- Advisors
- 천성순researcher; Chun, Sung-Soonresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1982
- Identifier
- 60779/325007 / 000775027
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 1982.2, [ iv, 91 p. ]
- Keywords
Deposition rate.; Chemical vapor deposition.
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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