Microwave-PCVD 방법으로 증착한 수소화된 비정질 규소 박막의 수소 희석에 관한 연구 = The effects of $H_2$ dilution on the a-Si:H films fabricated by microwave-PCVD

Advisors
이주천researcherLee, Choo-Chonresearcher
Publisher
한국과학기술원
Issue Date
1990
Identifier
67154/325007 / 000881314
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 물리학과, 1990.2, [ [ii], 31 p. ]

URI
http://hdl.handle.net/10203/48237
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=67154&flag=t
Appears in Collection
PH-Theses_Master(석사논문)
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