RF 글로우 방전에 의한 boron 및 phosphorous 가 도핑된 미세결정 규소의 제작에 관한 연구Fabrication of boron and phosphorous doped microcrystalline silicon by RF glow discharge method
- Advisors
- 이주천; Lee, Choo-Chon
- Description
- 한국과학기술원 : 물리학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1988
- Identifier
- 66113/325007 / 000861318
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 물리학과, 1988.2, [ ii, 27 p. ]
- Appears in Collection
- PH-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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