RF 글로우 방전에 의한 boron 및 phosphorous 가 도핑된 미세결정 규소의 제작에 관한 연구 = Fabrication of boron and phosphorous doped microcrystalline silicon by RF glow discharge method

Advisors
이주천researcherLee, Choo-Chonresearcher
Publisher
한국과학기술원
Issue Date
1988
Identifier
66113/325007 / 000861318
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 물리학과, 1988.2, [ ii, 27 p. ]

URI
http://hdl.handle.net/10203/48191
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=66113&flag=t
Appears in Collection
PH-Theses_Master(석사논문)
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