전자 현미경 관찰에 의한 3층 레지스트 리소그라피 연구 = Electron microscopic investigation on trilayer resist processing for fine line optical lithography

Advisors
박신종researcher이상수researcherPark, Sin-ChongresearcherLee, Sang-Sooresearcher
Publisher
한국과학기술원
Issue Date
1986
Identifier
65015/325007 / 000821913
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 물리학과, 1986.2, [ iv, 71 p. ]

URI
http://hdl.handle.net/10203/48130
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=65015&flag=t
Appears in Collection
PH-Theses_Master(석사논문)
Files in This Item
There are no files associated with this item.
  • Hit : 59
  • Download : 0
  • Cited 0 times in thomson ci

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0