플라즈마 화학 증착법으로 제작한 미세 결정 규소 박막의 특성에 관한 연구 = Charaterization of microcrystalline silicon films drepared by plasma enhanced chemical vapor deposition

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Advisors
신성철researcher이주천researcherShin, Sung-ChulresearcherLee, Choo-Chonresearcher
Description
한국과학기술원 : 물리학과,
Publisher
한국과학기술원
Issue Date
1996
Identifier
105327/325007 / 000895497
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 물리학과, 1996.2, [ xi, 103 p. ]

Keywords

TEM; PECVD; XRD; silicon tetrafluoride; microcrystalline silicon; 플라즈마 화학증착법; 미세결정 규소

URI
http://hdl.handle.net/10203/47525
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=105327&flag=dissertation
Appears in Collection
PH-Theses_Ph.D.(박사논문)
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