모든 3차 수차를 제거하여 회절한계의 성능을 지닌 극자외선 lithography용 4-반사경 광학계(배율=1) = Four-mirror optical imaging system (magnification=1) for subhalf-micron lithography derived from the solutions of all zero 3rd order optical aberrations

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Advisors
공홍진researcher이상수researcherKong, Hong-JinresearcherLee, Sang-Sooresearcher
Description
한국과학기술원 : 물리학과,
Publisher
한국과학기술원
Issue Date
1994
Identifier
68909/325007 / 000895477
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 물리학과, 1994.2, [ iv, 94 p. ]

URI
http://hdl.handle.net/10203/47490
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=68909&flag=dissertation
Appears in Collection
PH-Theses_Ph.D.(박사논문)
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