펄스 마그테트론 스퍼터링 소스의 플라즈마 특성과 증착율에 대한 연구 = Characteristics of plasma and deposition rate in pulsed-DC magnetron sputtering source

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Advisors
장홍영researcherChang, Hong-youngresearcher
Description
한국과학기술원 : 물리학과,
Publisher
한국과학기술원
Issue Date
2009
Identifier
309038/325007  / 020045225
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 물리학과, 2009. 2, [ v, 115 p. ]

Keywords

magnetron sputtering; pulsed-DC; ion bombardment energy; deposition rate; two step pulse; 마그네트론 스퍼터링; 직류 펄스; 이온 충돌 에너지; 증착율; 이단 펄스

URI
http://hdl.handle.net/10203/47444
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=309038&flag=dissertation
Appears in Collection
PH-Theses_Ph.D.(박사논문)
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