Growth mechanism of polycrystalline silicon using silane gases by LPCVD = 사일렌 가스를 사용하여 저압화학증착법으로 증착한 다결정 실리콘의 성장에 관한 연구

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The growth of Si films on Si or $SiO_2$ substrates is of immense interest in Si device technology. For the last application, glass substrates must be used limiting the temperature at which the silicon layers are formed around 600℃, the softening point of glass. Devices with suitable characteristics have been obtained using chemical vapor deposition (CVD), e-beam evaporation, or molecular-beam epitaxy (MBE) of polysilicon films. CVD of Si as a technique to obtain thin film structures is very important, since films of high purity or films of controlled content can be easily obtained. Pyrolysis of silane gases at pressures lower than that of atmospheric pressure chemical vapor deposition (APCVD) resuls in partially or totally polycrystalline silicon films of different textures, namely, a <111> or <311> preferred orientation, depending on the temperature of deposition. The microstructure and growth mechanisms of as-deposited polysilicon and mixed-phase silicon films deposited on glass substrates by infra-low pressure chemical vapor deposition (ILPCVD) and low pressure chemical vapor deposition (LPCVD) using 20% $Si_2H_6$/He gas, and 20% $SiH_4/H_2$ have been investigated by X-ray diffraction (XRD) pattern, Raman spectroscopy, and cross-section transmission electron microscopy (XTEM). The deposition temperature and pressure were in the range of 560℃ ~ 600℃ and below 10 mTorr, respectively, in ILPCVD. In LPCVD the deposition temperature and pressure were 600℃ and below 110 mTorr, respectively. In as-deposited polysilicon, there are two kinds of competing factor in crystal growth, crystal growth rate and difficulty of extinguishments. At moderate deposition temperature, the difficulty of extinguishments dominate in the case of columnar growth at higher pressures. Thus <220> columnar growth results. In the case of columnar growth at higher temperatures, faster crystal growth dominates and <100> crystal growth appears at higher pressures where nucleation density is high...
Advisors
Shin, Sung-ChulresearcherLee, Choo-Chonresearcher신성철researcher이주천researcher
Description
한국과학기술원 : 물리학과,
Publisher
한국과학기술원
Issue Date
2000
Identifier
157963/325007 / 000885307
Language
eng
Description

학위논문(박사) - 한국과학기술원 : 물리학과, 2000.2, [ vii, 76 p. ]

Keywords

Mixed-phase; Growth mechanism; Columnar growth; 저압화학증착법; 다결정실리콘; 혼합상; 성장 기작; 주상 성장; LPCVD; Polysilicon

URI
http://hdl.handle.net/10203/47223
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=157963&flag=dissertation
Appears in Collection
PH-Theses_Ph.D.(박사논문)
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