Flow and heat transfer characteristics in a rotating disk chemical vapor deposition

Abstract

Steady, laminar, axisymetric flow and heat transfer including the effects of the variable properties and radiative heat transfer with non-participating gas has been modeled numerically for a rotating disk chemical vapor deposition reactor(CVD). The reactor is oriented vertically with hot isothermal rotating disk facing upward. Naver-Stokes and energy equations have been solved for the carrier gas helium (He). The radiative transfer equation also has been solved using the zone method with non-participating media. The solution has been obtained over a range of parameters, which are important in CVD applications. Results are obtained for the velocity and temperature field and uniformity of deposition is presented as local Neselt Number at the surface of the rotating disk with the variation of the parameters. The thermal boundary condition at the reactor wall has an important effect in the formation of buoyancy-driven secondary cell when radiation effect is considered. Ruducation of the buoyancy effect on the heated reactor wall by changing the boundary condition improve the uniformity of deposition. It includes : lowering the emissivity of the reactor wall and active cooling of the reactor wall.