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Results 1-2 of 2 (Search time: 0.002 seconds).


Improvement of voltage linearity in high-kappa MIM capacitors using HfO2-SiO2 stacked dielectric

Kim, SJ; Cho, Byung Jinresearcher; Li, MF; Ding, SJ; Zhu, CX; Yu, MB; Chin, A; Kwong, DL, IEEE ELECTRON DEVICE LETTERS, v.25, no.8, pp.538 - 540, 2004-08


Cubic-Structured HfO2 With Optimized Doping of Lanthanum for Higher Dielectric Constant

He, Wei; Zhang, Lu; Chan, Daniel S. H.; Cho, BJ; Zhang, L; Cho, Byung Jinresearcher, IEEE ELECTRON DEVICE LETTERS, v.30, no.6, pp.623 - 625, 2009-06

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