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Results 1-2 of 2 (Search time: 0.002 seconds).

1

MOS characteristics of synthesized HfAlON-HfO2 stack using AIN-HfO2

Park, CS; Cho, Byung Jinresearcher; Kwong, DL, IEEE ELECTRON DEVICE LETTERS, v.25, no.9, pp.619 - 621, 2004-09

2

Tensile-strained germanium CMOS integration on silicon

Zang, H; Loh, WY; Ye, JD; Lo, GQ; Cho, Byung Jinresearcher, IEEE ELECTRON DEVICE LETTERS, v.28, no.12, pp.1117 - 1119, 2007-12

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