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Results 1-2 of 2 (Search time: 0.001 seconds).


A high performance MIM capacitor using HfO(2) dielectrics

Hu, H; Zhu, CX; Lu, YF; Li, MF; Cho, Byung Jinresearcher; Choi, WK, IEEE ELECTRON DEVICE LETTERS, v.23, no.9, pp.514 - 516, 2002-09


Dopant-free FUSI PtxSi metal gate for high work function and reduced Fermi-level pinning

Park, CS; Cho, Byung Jinresearcher, IEEE ELECTRON DEVICE LETTERS, v.26, no.11, pp.796 - 798, 2005-11

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