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Results 1-10 of 14 (Search time: 0.005 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) Altmetrics
1
Article
Thermal instability of effective work function in metal/high-kappa stack and its material dependence

Joo, MS; Cho, Byung Jinresearcher; Balasubramanian, N; Kwong, DL, IEEE ELECTRON DEVICE LETTERS, v.25, no.11, pp.716 - 718, 2004-11

2
Article
Strained Si/SiGe channel with buried Si0.99C0.01 for improved drivability, gate stack integrity and noise performance

Loh, WY; Zang, H; Oh, HJ; Choi, KJ; Nguyen, HS; Lo, GQ; Cho, Byung Jinresearcher, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.54, pp.3292 - 3298, 2007-12

3
Article
Conduction mechanism under quasibreakdown of ultrathin gate oxide

He, YD; Guan, H; Li, MF; Cho, Byung Jinresearcher; Dong, Z, APPLIED PHYSICS LETTERS, v.75, no.16, pp.2432 - 2434, 1999-10

4
Article
DEVELOPMENT OF A HEXAGONAL-SHAPED RAPID THERMAL PROCESSOR USING A VERTICAL TUBE

Cho, Byung Jinresearcher; VANDENABEELE, P; MAEX, K, IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.7, no.3, pp.345 - 353, 1994-08

5
Article
Annealing behavior of gate oxide leakage current after quasi-breakdown

Xu, Z; Cho, Byung Jinresearcher; Li, MF, MICROELECTRONICS RELIABILITY, v.40, pp.1341 - 1346, 2000

6
Article
Experimental evidence of interface-controlled mechanism of quasi-breakdown in ultrathin gate oxide

Guan, H; Cho, Byung Jinresearcher; Li, MF; Xu, Z; He, YD; Dong, Z, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.48, no.5, pp.1010 - 1013, 2001-05

7
Article
ESTIMATION OF EFFECTIVE DIFFUSION TIME IN A RAPID THERMAL-DIFFUSION USING A SOLID DIFFUSION SOURCE

Cho, Byung Jinresearcher; PARK, SK; Kim, Choong Ki, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.39, no.1, pp.111 - 117, 1992-01

8
Article
Bias and thermal annealings of radiation-induced leakage currents in thin-gate oxides

Ang, CH; Ling, CH; Cheng, ZY; Kim, SJ; Cho, Byung Jinresearcher, IEEE TRANSACTIONS ON NUCLEAR SCIENCE, v.47, no.6, pp.2764 - 4, 2000-12

9
Article
Evolution of quasi-breakdown in thin gate oxides

Loh, WY; Cho, Byung Jinresearcher; Li, MF, JOURNAL OF APPLIED PHYSICS, v.91, no.8, pp.5302 - 5306, 2002-04

10
Article
A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFETs

Guan, H; Li, MF; He, YD; Cho, Byung Jinresearcher; Dong, Z, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.47, no.8, pp.1608 - 1616, 2000-08

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