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NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
Effects of SiO2/Si3N4 hard masks on etching properties of metal gates

Hwang, WS; Cho, Byung Jinresearcher; Chan, DSH; Bliznetsov, V; Yoo, WJ, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.24, no.6, pp.2689 - 2694, 2006-11


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