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|NO||Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)|
|1||Thermal instability of effective work function in metal/high-kappa stack and its material dependence|
Joo, MS; Cho, Byung Jinresearcher; Balasubramanian, N; Kwong, DL, IEEE ELECTRON DEVICE LETTERS, v.25, no.11, pp.716 - 718, 2004-11
|2||Strained Si/SiGe channel with buried Si0.99C0.01 for improved drivability, gate stack integrity and noise performance|
Loh, WY; Zang, H; Oh, HJ; Choi, KJ; Nguyen, HS; Lo, GQ; Cho, Byung Jinresearcher, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.54, pp.3292 - 3298, 2007-12