ECR $N_2O$-플라즈마 산화 및 응용 = Ecr $N_2O$-plasma oxidation and its applications

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Advisors
이희철researcherLee, Hee-Chulresearcher
Description
한국과학기술원 : 전기 및 전자공학과,
Publisher
한국과학기술원
Issue Date
1996
Identifier
106401/325007 / 000943446
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 전기 및 전자공학과, 1996.2, [ iv, 85 p. ]

Keywords

다결정 실리콘; 얇은 게이트 산화막; 질화 산화막; ECR N2O-플라즈마; 다결정 산화막; Polyoxide; Polysilicon TFT; Thin gate oxide; Oxynitride; ECR N2O-Plasma

URI
http://hdl.handle.net/10203/36869
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=106401&flag=dissertation
Appears in Collection
EE-Theses_Master(석사논문)
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