RF magnetron sputtering 법에 의한 $Ba_{0.7}Sr_{0.3}TiO_3$ 박막의 제조 및 전기적 특성 평가Fabrications and charaterizations of electrical properties of $Ba_{0.7}Sr_{0.3}TiO_3$ thin films deposited by rf magnetron sputtering
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 이희철 | - |
| dc.contributor.advisor | Lee, Hee-Chul | - |
| dc.contributor.author | 이승훈 | - |
| dc.contributor.author | Lee, Seung-Hoon | - |
| dc.date.accessioned | 2011-12-14T01:39:05Z | - |
| dc.date.available | 2011-12-14T01:39:05Z | - |
| dc.date.issued | 1996 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=106396&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/36864 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 전기 및 전자공학과, 1996.2, [ ii, 76 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 산화막 유효두께 | - |
| dc.subject | 유전상수 | - |
| dc.subject | 계면 | - |
| dc.subject | 산소결핍 | - |
| dc.subject | O2 vacancy | - |
| dc.subject | Equivalent oxide thickness | - |
| dc.subject | Dielectric constant | - |
| dc.subject | Interface | - |
| dc.title | RF magnetron sputtering 법에 의한 $Ba_{0.7}Sr_{0.3}TiO_3$ 박막의 제조 및 전기적 특성 평가 | - |
| dc.title.alternative | Fabrications and charaterizations of electrical properties of $Ba_{0.7}Sr_{0.3}TiO_3$ thin films deposited by rf magnetron sputtering | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 106396/325007 | - |
| dc.description.department | 한국과학기술원 : 전기 및 전자공학과, | - |
| dc.identifier.uid | 000943404 | - |
| dc.contributor.localauthor | 이희철 | - |
| dc.contributor.localauthor | Lee, Hee-Chul | - |
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