Microwave performance improvement of AlGaAs/GaAs heterojunction bipolar transistor using the selective lateral etching technique선택적 측면 식각 방법을 이용한 AlGaAs/GaAs 이종 접합 바이폴라 트랜지스터의 고주파 성능 향상

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The new method for improving microwave performance of $Al_{0.3}Ga_{0.7}As/GaAs$ heterojunction bipolar transistor (HBT) was investigated. In this method, extrinsic base-collector capacitance was decreased using selectively lateral etching technique with redox solution ($I_2$/KI). The redox solution used to etch selectively the $Al_{0.3}Ga_{0.7}As$ relative to GaAs has highly preferential etching property and a high etching rate. With optimum etching condition, the undercut width of $Al_{0.3}Ga_{0.7}As$ relative to GaAs was approximately measured up to 3㎛ at the condition of [$I_2$]/[KI]=0.67 and pH=3.0 for [100] directional stripe. The undercut width was found to be remarkably increased with increasing the stirring speed near the chemically neutral etching solution. To verify selectively lateral etching effect, the conventional and lateral-etched HBTs were fabricated upon the HBT epitaxial layer structure with a composite subcollector layer, composing of $n^+-GaAs$ and $N^+-Al_{0.3}Ga_{0.7}As$. As the result, dc characteristics of the lateral etched HBT were very similar to those of the conventional HBT except the collector current density for maximum dc current gain. For 3㎛×20㎛ emitter size, although the maximum current gain is nearly the same for both devices, the dc current gain of lateral etched HBT was reduced a little than that of conventional HBT which has the gain of 25 at the collector current density (Jc) of 9kA/㎠, resulting in 21 at the same collector current density. From Gummel plots, ideality factors of base and collector current were estimated as 1.5 and 1.01 for both samples, respectively. Although both samples showed the similar dc characteristics, microwave characteristics such as maximum oscillation frequency($f_max$) and unity current gain cutoff frequency($f_T$) revealed the large difference. The microwave properties of HBTs were examined by cutoff mode S-parameters measurement. From the simulation for both device structures, about 60% red...
Advisors
Lee, Hee-Chulresearcher이희철researcher
Description
한국과학기술원 : 전기및전자공학과,
Publisher
한국과학기술원
Issue Date
1998
Identifier
134750/325007 / 000925555
Language
eng
Description

학위논문(박사) - 한국과학기술원 : 전기및전자공학과, 1998.2, [ v, 142 p. ]

Keywords

Redox solution; Selective lateral etching; Heterojunction bipolar transistor; AlGaAs/GaAs; Base-collector capacitance; 고주파 성능; 베이스-콜랙터 정전용량; 이종 접합 바이폴라 트랜지스터; 선택적 측면 식각; Microwave performance

URI
http://hdl.handle.net/10203/36420
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=134750&flag=dissertation
Appears in Collection
EE-Theses_Ph.D.(박사논문)
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